REDEEM Thin-Film Flow Reactor
Overview:
The Thin Film Reactor is a flow reactor that forms a thin liquid film to create very high surface area contact with reactor walls, enabling strong heat transfer and mass transfer. This is particularly useful in processes that benefit from high heat exchange.
Specifications:
Depth: 0.1 - 5 mm
Volume: 0.26 - 13.19 mL
Illuminated area: 26.38 cm²
Flow cross section: 4.8-240 mm²
Temperature range: -20/200°C (300°C upon request)
Pressure range: Up to 12 bar
Residence time: ~ 1/52 - 1020/52740 seconds
Materials option: Stainless steel, Hastelloy, Cu, PEEK, Anodized Al
Window options: Borosilicate, quartz, ITO, Sapphire
Dimensions: 8.6 x 7.2 cmKey Benefits of Thin-Film:
Controllable film thickness
Efficient mass and heat transfer due to high-surface area
Increase reproducibility of the reaction
Possible applications:
Best for evaporation, concentration, and drying operations in flow, and for reactions or steps where removing volatiles supports performance. See the publications (Photocatalytic H₂ evolution, Oxidative coupling, Water splitting) with the Thin Film reactor.
Liquid-Liquid
Homogeneous dispersion of immiscible fluids.
Solid-Liquid
Ideal for solid deposition.
Design and Operation:
Robust and Highly Efficient Structure
Modular design made of stainless steel and corrosion-resistant materials, ensuring durability and compatibility with a wide range of reactants.
Optimized configuration for seamless integration with existing industrial equipment and processes.
Simplified operation, reducing the need for manual intervention and maintenance.
Applications
The Redeem Thin-Film Flow Reactor is the ideal solution for a wide range of industries, including:
Pharmaceutical Industry
Synthesis of active ingredients with high purity and repeatability.
Chemical Industry
Production of polymers, catalysts, and fine chemicals.
Energy sector
Applications in biofuels and thermal conversion processes.
Nanotechnology
Production of nanoparticles and advanced materials.